Post-doc - Theoretical Surface Chemistry

Extreme ultraviolet lithography (EUVL) is one of the technology candidates for next-generation lithography. One of the major obstacles towards the introduction of EUVL is the degradation of the extreme ultraviolet (EUV) optics due to surface contamination. The goal of SEMATECH’s EUVL program is to accelerate EUVL infrastructure readiness to support introduction of EUVL technology in pilot lines at the 32 nm half-pitch node.

The successful candidate will support projects in the area of EUV optics contamination and closely work with other team members, suppliers, universities and national laboratories. The goal of the research is to understand the effects of EUV radiation on the surface contamination of EUV multilayer mirrors (MLM). MLMs are very precise structures consisting of an ultra-smooth substrate coated with 40 Molybdenum/Silicon bilayer pairs (each 7 nm thick) covered with a ~ 2-nm capping layer of an oxidation-resistant material. The 13.5 nm EUV radiation induces competing processes of oxidation, due to residual water vapor, and carbonization, due to gaseous hydrocarbons coming from photoresist outgassing and other sources in the high-vacuum environment of the lithography stepper. Both oxidation and carbonization of the surface are induced by EUV photons and low-energy secondary electrons.

The project objective is to fundamentally understand the EUV radiation-induced surface reactions at a level which enables prediction of the optics contamination rates under various conditions. Research will consist of theoretically modeling the surface reaction chemistry and numerically implementing the model of the MLM surface contamination.

The successful candidate will demonstrate achievements and experience in computational surface chemistry, theory of surface reaction mechanisms, reaction kinetics, and photochemistry.

SEMATECH offers a very competitive salary. The position is a two-year position, will be based in Albany, NY, USA and require approximately 5 % travel.

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SEMATECH is the world's catalyst for accelerating the commercialization of technology innovations into manufacturing solutions. By setting global direction, creating opportunities for flexible collaboration, and conducting strategic R&D, SEMATECH delivers significant return on investment to our semiconductor and emerging technology partners.

Our Albany-based programs, in partnership with University at Albany-SUNY's College of Nanoscale Science and Engineering, focus on R&D in  leading-edge lithography, 3D interconnect, metrology, and other advanced technologies. These programs are supported by researchers, scientists, engineers, and technicians from SEMATECH, CNSE, and other partners.